本(ben)發(fa)明涉及(ji)一種(zhong)導(dao)流反射型上噴噴頭，尤其是應用于冷卻塔配水系統(tong)中的噴頭。

背景技術：

冷(leng)卻(que)塔(ta)是用于(yu)將(jiang)攜帶廢熱的(de)冷(leng)卻(que)水(shui)在塔(ta)內(nei)與空(kong)氣(qi)(qi)進(jin)行(xing)熱交換，使廢熱傳輸給空(kong)氣(qi)(qi)并散入大(da)氣(qi)(qi)，冷(leng)卻(que)塔(ta)在能源、石化(hua)、冶(ye)金(jin)等(deng)行(xing)業有著(zhu)廣泛應(ying)用，冷(leng)卻(que)塔(ta)主要由塔(ta)體、填料、包括(kuo)有配水(shui)管和(he)噴濺裝置的(de)配水(shui)系統、收水(shui)器、集(ji)水(shui)池等(deng)部(bu)件構(gou)成。

噴頭是冷卻塔配水系統的重要組成部分,其作用是將冷卻水噴濺成細小水滴，均勻地布灑到填料上，以達到較高的冷卻效果。冷卻塔工作性能的優劣與所采用的噴濺裝置的形式以及工作狀況的好壞有很大關系，進入冷卻塔中的水能否沿著淋水面均勻地分配，對冷卻塔的冷卻效果具有十分重大的影響。當水的分配不當時,會出現大片非淋水區或不良淋水區，從而減小了冷卻面積，降低通風能力。有資料表明，如果4000m²冷卻(que)塔(ta)的(de)(de)(de)不均(jun)勻(yun)系數由(you)(you)0.0增加到0.2，出塔(ta)循片水(shui)溫度將(jiang)會(hui)(hui)(hui)升高(gao)0.5℃，其(qi)變(bian)(bian)化(hua)呈幾(ji)何級(ji)數增加的(de)(de)(de)趨勢。因此，在其(qi)它(ta)條件(jian)不變(bian)(bian)的(de)(de)(de)情(qing)況下(xia)，改(gai)善冷卻(que)塔(ta)的(de)(de)(de)布(bu)水(shui)情(qing)況和(he)淋灑的(de)(de)(de)分散均(jun)勻(yun)性(xing)，將(jiang)會(hui)(hui)(hui)提高(gao)冷卻(que)塔(ta)的(de)(de)(de)換(huan)熱效(xiao)率。而提高(gao)淋水(shui)的(de)(de)(de)分散均(jun)勻(yun)性(xing)主要由(you)(you)噴(pen)濺裝置(zhi)的(de)(de)(de)水(shui)力(li)特性(xing)來保證，其(qi)包括(kuo)流量(liang)系數、不均(jun)勻(yun)系數和(he)噴(pen)濺半徑等，不同(tong)結構形式的(de)(de)(de)噴(pen)濺裝置(zhi)由(you)(you)于水(shui)力(li)特性(xing)不同(tong)將(jiang)會(hui)(hui)(hui)有不同(tong)的(de)(de)(de)冷卻(que)換(huan)熱效(xiao)率。

現有技術中的噴濺裝(zhuang)(zhuang)置(zhi)結構形式較多，目(mu)前在(zai)(zai)雙曲線自然(ran)濕式冷卻塔和(he)機(ji)力(li)通風冷卻塔上投入較多的噴濺裝(zhuang)(zhuang)置(zhi)，按(an)其(qi)與(yu)配(pei)水管(guan)的連接(jie)形式大(da)致分為兩(liang)大(da)類，一類是安(an)裝(zhuang)(zhuang)在(zai)(zai)配(pei)水管(guan)下(xia)方的下(xia)噴式噴頭(tou)，另一類是安(an)裝(zhuang)(zhuang)在(zai)(zai)配(pei)水管(guan)上方的上噴噴頭(tou)。

目前(qian)投入(ru)使用(yong)(yong)的(de)上(shang)噴(pen)(pen)(pen)(pen)(pen)噴(pen)(pen)(pen)(pen)(pen)頭存在的(de)問題(ti)是：在低水(shui)(shui)壓下(xia)噴(pen)(pen)(pen)(pen)(pen)頭噴(pen)(pen)(pen)(pen)(pen)出的(de)射流成股(gu)狀，水(shui)(shui)滴(di)粒徑大，噴(pen)(pen)(pen)(pen)(pen)濺半徑小(xiao)，布水(shui)(shui)不(bu)均等問題(ti)。由于配水(shui)(shui)壓力較低，采用(yong)(yong)上(shang)噴(pen)(pen)(pen)(pen)(pen)噴(pen)(pen)(pen)(pen)(pen)頭的(de)噴(pen)(pen)(pen)(pen)(pen)濺裝置在這(zhe)類技術性能上(shang)的(de)不(bu)足已經制約了冷(leng)卻塔冷(leng)卻效率的(de)進一步提高。

技術實現要素：

本發明是為(wei)避免(mian)上(shang)述現有技術所存在(zai)的(de)不(bu)足，提供一種導流反射型上(shang)噴(pen)噴(pen)頭，以達到布水(shui)均勻、濺水(shui)半徑大(da)、水(shui)滴細小、水(shui)滴滯空時(shi)間(jian)長的(de)噴(pen)水(shui)效果，進(jin)行提高冷(leng)卻(que)塔的(de)冷(leng)卻(que)效率。

本(ben)發明(ming)為解決(jue)技(ji)術問題采(cai)用如下(xia)技(ji)術方案：

本發明導(dao)流反射型上(shang)噴(pen)噴(pen)頭的(de)(de)結構特點是：在(zai)呈豎直的(de)(de)噴(pen)頭進(jin)水(shui)(shui)(shui)接頭中(zhong)設(she)(she)置噴(pen)管，在(zai)噴(pen)頭本體(ti)的(de)(de)頂(ding)部設(she)(she)置環形(xing)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)碟，在(zai)所(suo)(suo)述環形(xing)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)碟的(de)(de)外圓(yuan)周(zhou)上(shang)不同半(ban)徑位置上(shang)分別(bie)設(she)(she)置內(nei)圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒和外圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒，所(suo)(suo)述外圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒與內(nei)圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒在(zai)圓(yuan)周(zhou)上(shang)一一間隔；在(zai)所(suo)(suo)述噴(pen)管的(de)(de)出水(shui)(shui)(shui)管口的(de)(de)正(zheng)上(shang)方(fang)設(she)(she)置導(dao)流體(ti)，噴(pen)管中(zhong)的(de)(de)出水(shui)(shui)(shui)經導(dao)流體(ti)的(de)(de)引導(dao)落(luo)入所(suo)(suo)述環形(xing)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)碟或沿導(dao)流體(ti)的(de)(de)出口下沿向(xiang)周(zhou)向(xiang)散射，周(zhou)向(xiang)散射的(de)(de)射流在(zai)所(suo)(suo)述內(nei)圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒和外圈(quan)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)齒上(shang)濺(jian)(jian)(jian)(jian)散，從而(er)形(xing)成(cheng)立體(ti)濺(jian)(jian)(jian)(jian)水(shui)(shui)(shui)。

本(ben)發明(ming)導流反射型上噴(pen)噴(pen)頭的結(jie)構特點也在(zai)于：

所述環形(xing)濺(jian)水碟(die)的碟(die)面成(cheng)拱(gong)形(xing)，為上拱(gong)或(huo)為下(xia)拱(gong)。

所述(shu)內圈濺(jian)(jian)(jian)水(shui)齒(chi)垂直于(yu)環(huan)形濺(jian)(jian)(jian)水(shui)碟的(de)(de)表面，所述(shu)外(wai)圈濺(jian)(jian)(jian)水(shui)齒(chi)在環(huan)形濺(jian)(jian)(jian)水(shui)碟的(de)(de)表面朝向外(wai)周(zhou)呈傾斜，根據(ju)所需要的(de)(de)濺(jian)(jian)(jian)水(shui)分別(bie)設置內圈濺(jian)(jian)(jian)水(shui)齒(chi)的(de)(de)高度、外(wai)圈濺(jian)(jian)(jian)水(shui)齒(chi)的(de)(de)高度，以及外(wai)圈濺(jian)(jian)(jian)水(shui)齒(chi)的(de)(de)傾斜角度。

所述導流體通過支架固定設置在(zai)噴頭(tou)本體上。

與已有技(ji)術相比，本發明(ming)有益效(xiao)果體現(xian)在：

本發明利用導(dao)流反射(she)技術，水(shui)(shui)(shui)流自(zi)噴管垂(chui)直向上射(she)出，遇導(dao)流體后(hou)折向四周(zhou)散(san)射(she)，周(zhou)向散(san)射(she)的(de)射(she)流遇濺(jian)水(shui)(shui)(shui)齒(chi)后(hou)射(she)流被濺(jian)散(san)成細小的(de)水(shui)(shui)(shui)滴并被高高的(de)向上拋起，然后(hou)沿拋物線軌跡落(luo)下，設置內圈濺(jian)水(shui)(shui)(shui)齒(chi)和外(wai)圈濺(jian)水(shui)(shui)(shui)齒(chi)所處(chu)的(de)半徑(jing)不(bu)同，其所濺(jian)散(san)開的(de)水(shui)(shui)(shui)滴的(de)運動(dong)軌跡也不(bu)相同，其濺(jian)散(san)高度高，濺(jian)散(san)半徑(jing)大(da)，水(shui)(shui)(shui)滴細小，濺(jian)散(san)均勻性好。

附圖說明

圖1為本發明中噴頭結構示意圖；

圖(tu)2為本發(fa)明中噴頭主視示(shi)意圖(tu)；

圖3為本(ben)發明中噴頭俯視示(shi)意圖；

圖中(zhong)標號：1噴(pen)頭進(jin)水接頭；2噴(pen)管；3濺(jian)水碟；4濺(jian)水齒；5導流(liu)體，6支架(jia)；4a外圈濺(jian)水齒；4b內圈濺(jian)水齒；7噴(pen)頭本體。

具體實施方式

參見圖1、圖2和(he)(he)圖3，本實施(shi)例中(zhong)(zhong)導(dao)流(liu)(liu)反射(she)型上(shang)(shang)(shang)(shang)噴(pen)噴(pen)頭(tou)(tou)(tou)的(de)(de)結構(gou)形(xing)(xing)式(shi)是(shi)：在(zai)(zai)(zai)(zai)配水(shui)(shui)(shui)(shui)(shui)管(guan)(guan)(guan)(guan)管(guan)(guan)(guan)(guan)座上(shang)(shang)(shang)(shang)呈豎(shu)直安(an)裝噴(pen)頭(tou)(tou)(tou)進水(shui)(shui)(shui)(shui)(shui)接頭(tou)(tou)(tou)1，在(zai)(zai)(zai)(zai)噴(pen)頭(tou)(tou)(tou)進水(shui)(shui)(shui)(shui)(shui)接頭(tou)(tou)(tou)1中(zhong)(zhong)設(she)(she)置(zhi)噴(pen)管(guan)(guan)(guan)(guan)2，噴(pen)管(guan)(guan)(guan)(guan)2下段為(wei)直管(guan)(guan)(guan)(guan)進水(shui)(shui)(shui)(shui)(shui)管(guan)(guan)(guan)(guan)段，噴(pen)管(guan)(guan)(guan)(guan)2的(de)(de)上(shang)(shang)(shang)(shang)段為(wei)上(shang)(shang)(shang)(shang)口(kou)小(xiao)下口(kou)大的(de)(de)錐形(xing)(xing)射(she)水(shui)(shui)(shui)(shui)(shui)管(guan)(guan)(guan)(guan)段，在(zai)(zai)(zai)(zai)噴(pen)頭(tou)(tou)(tou)本體(ti)(ti)(ti)7的(de)(de)頂部設(she)(she)置(zhi)環形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)碟(die)(die)3，在(zai)(zai)(zai)(zai)環形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)碟(die)(die)3的(de)(de)外(wai)圓(yuan)(yuan)周(zhou)上(shang)(shang)(shang)(shang)設(she)(she)置(zhi)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4，具體(ti)(ti)(ti)是(shi)在(zai)(zai)(zai)(zai)環形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)碟(die)(die)3的(de)(de)外(wai)圓(yuan)(yuan)周(zhou)上(shang)(shang)(shang)(shang)不(bu)(bu)同半徑位置(zhi)上(shang)(shang)(shang)(shang)分別設(she)(she)置(zhi)內(nei)(nei)(nei)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4b和(he)(he)外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4a，外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4a與(yu)內(nei)(nei)(nei)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4b在(zai)(zai)(zai)(zai)圓(yuan)(yuan)周(zhou)上(shang)(shang)(shang)(shang)一一間(jian)隔；在(zai)(zai)(zai)(zai)噴(pen)管(guan)(guan)(guan)(guan)2的(de)(de)出水(shui)(shui)(shui)(shui)(shui)管(guan)(guan)(guan)(guan)口(kou)的(de)(de)正(zheng)上(shang)(shang)(shang)(shang)方設(she)(she)置(zhi)導(dao)流(liu)(liu)體(ti)(ti)(ti)5，噴(pen)管(guan)(guan)(guan)(guan)2中(zhong)(zhong)的(de)(de)出水(shui)(shui)(shui)(shui)(shui)經導(dao)流(liu)(liu)體(ti)(ti)(ti)5的(de)(de)引導(dao)落(luo)入(ru)環形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)碟(die)(die)3或沿導(dao)流(liu)(liu)體(ti)(ti)(ti)5的(de)(de)出口(kou)下沿向周(zhou)向散(san)射(she)，周(zhou)向散(san)射(she)的(de)(de)射(she)流(liu)(liu)在(zai)(zai)(zai)(zai)內(nei)(nei)(nei)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4b和(he)(he)外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4a上(shang)(shang)(shang)(shang)濺(jian)(jian)(jian)散(san)成(cheng)細(xi)小(xiao)的(de)(de)水(shui)(shui)(shui)(shui)(shui)滴并被高高地向上(shang)(shang)(shang)(shang)拋(pao)起，然后沿拋(pao)物線軌(gui)跡落(luo)下，由于內(nei)(nei)(nei)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4b和(he)(he)外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)齒(chi)4a所處的(de)(de)半徑不(bu)(bu)同，其(qi)所濺(jian)(jian)(jian)散(san)開的(de)(de)水(shui)(shui)(shui)(shui)(shui)滴的(de)(de)運動軌(gui)跡也不(bu)(bu)相同，從而形(xing)(xing)成(cheng)立體(ti)(ti)(ti)濺(jian)(jian)(jian)水(shui)(shui)(shui)(shui)(shui)，其(qi)濺(jian)(jian)(jian)散(san)高度(du)高，濺(jian)(jian)(jian)散(san)半徑大，水(shui)(shui)(shui)(shui)(shui)滴細(xi)小(xiao)，濺(jian)(jian)(jian)散(san)均(jun)勻性(xing)好(hao)，其(qi)在(zai)(zai)(zai)(zai)冷卻(que)塔(ta)配水(shui)(shui)(shui)(shui)(shui)系統中(zhong)(zhong)的(de)(de)運用可以顯(xian)著(zhu)提高冷卻(que)塔(ta)的(de)(de)冷卻(que)效率，降低(di)冷卻(que)塔(ta)出塔(ta)水(shui)(shui)(shui)(shui)(shui)溫。

具體(ti)實施中(zhong)，設(she)置環(huan)形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)碟(die)(die)3的(de)(de)(de)碟(die)(die)面成(cheng)拱(gong)(gong)形(xing)(xing)，為(wei)上拱(gong)(gong)或(huo)為(wei)下拱(gong)(gong)；其內圈濺(jian)(jian)(jian)水(shui)(shui)(shui)齒(chi)(chi)4b垂直于環(huan)形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)碟(die)(die)3的(de)(de)(de)表面，外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)齒(chi)(chi)4a在(zai)環(huan)形(xing)(xing)濺(jian)(jian)(jian)水(shui)(shui)(shui)碟(die)(die)3的(de)(de)(de)表面朝向外(wai)周呈傾(qing)斜(xie)，根(gen)據(ju)所(suo)需要的(de)(de)(de)濺(jian)(jian)(jian)水(shui)(shui)(shui)分別(bie)設(she)置內圈濺(jian)(jian)(jian)水(shui)(shui)(shui)齒(chi)(chi)4b的(de)(de)(de)高度(du)、外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)齒(chi)(chi)4a的(de)(de)(de)高度(du)，以及外(wai)圈濺(jian)(jian)(jian)水(shui)(shui)(shui)齒(chi)(chi)4a的(de)(de)(de)傾(qing)斜(xie)角度(du)，以獲(huo)得不同的(de)(de)(de)濺(jian)(jian)(jian)散(san)半徑和(he)濺(jian)(jian)(jian)散(san)高度(du)；導流體(ti)5通過支架(jia)6固(gu)定(ding)設(she)置在(zai)噴頭(tou)本體(ti)7上。